Vapor deposition of solid oligomers
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United States of America Patent
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Feb 28, 2006
Grant Date -
Jun 16, 2005
app pub date -
Jun 22, 2001
filing date -
Jul 2, 1999
priority date (Note) -
Expired
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Abstract
A monomer is selected to produce a polymeric film having desirable characteristics for a particular application. The monomer is ppolymerized under controlled conditions to produce a solid oligomer having those characteristics at a molecular weight suitable for evaporation under vacuum at a temperature lower than its thermal decomposition temperature. The process of polymerization to produce the oligomer is carried out under conditions that yield a finite molecular-chain length with no residual reactive groups. The solid oligomer so produced is extruded as a film onto a revolving drum (38) in the evaporation section (40) of a vapor deposition chamber, and then cryocondensed on a cold substrate (44) to form a solid film having the same characteristic selected in the solid oligomer constituting the starting material. As a result of the initial complete reaction to produce the oligomer, the thin-film product does not contain unreacted groups and all attendant disadvantages are avoided.
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Patent Owner(s)
| Patent Owner | Address | |
|---|---|---|
| SIGMA LABORATORIES OF ARIZONA LLC | 10960 N STALLARD PLACE TUCSON AS 85737 |
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Inventor(s)
| Inventor Name | Address | # of filed Patents | Total Citations |
|---|---|---|---|
| Mikhael, Michael G | Tucson, AZ | 33 | 789 |
| Yializis, Angelo | Tucson, AZ | 72 | 2796 |
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| Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
| Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
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