Apparatus and method for reducing the electron-beam-induced deposition of contamination products
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United States of America Patent
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Feb 28, 2006
Grant Date -
Oct 7, 2004
app pub date -
Mar 8, 2004
filing date -
Mar 26, 2003
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Abstract
In a device for examining a specimen with an electron beam, in particular an SEM, TEM, or CSEM, contamination products are often result from the irradiation. To reduce these contamination products, the surface of the object irradiated with the electron beam is simultaneously illuminated with light, in particular with UV light.
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