Apparatus for exposing substrate materials
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United States of America Patent
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Mar 28, 2006
Issued Date -
N/A
app pub date -
Sep 14, 2004
filing date -
Mar 15, 2002
priority date (Note) -
Expired
status (Latency Note)
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Abstract
The invention relates to a device for exposing substrate materials comprising: at least one optical exposure device, at least one substrate platform; a device for generating a relative displacement between the exposure device and the substrate platform in two transversal directions, whereby the relative displacement in a primary direction occurs with a greater dynamic response than in a secondary direction; at least one primary drive for generating the relative displacement in the primary direction; and at least one secondary drive for generating the relative displacement in the secondary direction. The aim of the invention is to position the substrate platform with the greatest possible accuarcy and the greatest possible dynamic response. To achieve this, the device comprises two substrate platforms that move substantially in opposition to one another in the primary direction.
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