Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece
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United States of America Patent
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Mar 28, 2006
Grant Date -
Mar 14, 2002
app pub date -
May 4, 2001
filing date -
Apr 13, 1999
priority date (Note) -
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status (Latency Note)
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Abstract
A facility for selecting and refining electrical parameters for processing a microelectronic workpiece in a processing chamber is described. The facility initially configures the electrical parameters in accordance with either a numerical of the processing chamber or experimental data derived from operating the actual processing chamber. After a workpiece is processed with the initial parameter configuration, the results are measured and a sensitivity matrix based upon the numerical model of the processing chamber is used to select new parameters that correct for any deficiencies measured in the processing of the first workpiece. These parameters are then used in processing a second workpiece, which may be similarly measured, and the results used to further refine the parameters.
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