Adaptive real time control of a reticle/mask system

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United States of America Patent

PATENT NO 7025280
APP PUB NO 20050167514A1
SERIAL NO

10769623

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Abstract

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An adaptive real time thermal processing system is presented that includes a multivariable controller. Generally, the method includes creating a dynamic model of the thermal processing system; incorporating reticle/mask curvature in the dynamic model; coupling a diffusion-amplification model into the dynamic thermal model; creating a multivariable controller; parameterizing the nominal setpoints into a vector of intelligent setpoints; creating a process sensitivity matrix; creating intelligent setpoints using an efficient optimization method and process data; and establishing recipes that select appropriate models and setpoints during run-time.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITED3-1 AKASAKA 5-CHOME MINATO-KU TOKYO 1076325 ?1076325

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kaushal, Sanjeev Austin, TX 37 885
Pandey, Pradeep San Jose, CA 26 558
Sugishima, Kenji Tokyo, JP 37 1201

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