Method for evaluating the quality of abrasive grains, polishing method and abrasive for polishing glass

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United States of America Patent

PATENT NO 7025796
APP PUB NO 20040139764A1
SERIAL NO

10717550

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Abstract

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A method for evaluating the quality of abrasive grains for polishing glass, which comprises adding abrasive grains to be measured, to an aqueous medium having silica dissolved therein, to have the silica adsorbed on the abrasive grains under such a condition that the silica undergoes substantially no polymerization in the aqueous medium, followed by solid-liquid separation to separate the abrasive grains from the mother liquor, and measuring the concentration of silica remaining in the mother liquor to measure the adsorption rate (η) of silica on the abrasive grains.

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Patent Owner(s)

Patent OwnerAddress
SEIMI CHEMICAL CO LTDKANAGAWA KANAGAWA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hisatsune, Tetsufumi Kanagawa, JP 1 6
Komiya, Hirotsugu Kanagawa, JP 1 6
Takenaka, Atsuyoshi Kanagawa, JP 11 115
Yamaguchi, Sumihisa Kanagawa, JP 3 49
Yonemori, Shigeaki Kanagawa, JP 7 29

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