Scatterometry alignment for imprint lithography
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United States of America Patent
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Apr 11, 2006
Issued Date -
N/A
app pub date -
Aug 1, 2002
filing date -
Aug 1, 2002
priority date (Note) -
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Abstract
Described are methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. Alignment of the template with a previously formed layer on a substrate, in one embodiment, is accomplished by using scatterometry.
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