Four-terminal methods for resistivity measurement of semiconducting materials
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United States of America Patent
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Apr 18, 2006
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app pub date -
Dec 3, 2004
filing date -
Dec 3, 2004
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Abstract
This invention provides an innovative multi-line structure and an effective four-terminal method for the resistivity measurement of semiconductor materials. The multi-line structure and the four-terminal method not only allow one to perform resistivity measurement on any inorganic and organic semiconductor thin film conveniently, rapidly and accurately but also offer the means to study resistivity uniformity across the semiconductor thin film.
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