Lithographic apparatus and method for optimizing an illumination source using photolithographic simulations
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United States of America Patent
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Apr 18, 2006
Grant Date -
Aug 12, 2004
app pub date -
Feb 9, 2004
filing date -
Feb 11, 2003
priority date (Note) -
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Abstract
A method for optimizing the illumination conditions of a lithographic apparatus by computer simulation, the lithographic apparatus including an illuminator and a projection system, includes defining a lithographic pattern to be printed on the substrate, selecting a simulation model, selecting a grid of source points in a pupil plane of the illuminator, calculating separate responses for individual source points, each of the responses representing a result of a single or series of simulations using the simulation model, and adjusting an illumination arrangement based on analysis of accumulated results of the separate calculations.
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