Methods of manufacturing a lithography template
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United States of America Patent
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May 2, 2006
Issued Date -
N/A
app pub date -
May 1, 2002
filing date -
May 1, 2002
priority date (Note) -
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status (Latency Note)
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Abstract
A method for forming imprint lithography templates is described herein. The method includes forming a masking layer and a conductive layer on a substrate surface. The use of a conductive layer allows patterning of the masking layer using electron beam pattern generators. The substrate is etched using the patterned masking layer to produce a template.
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