Developing photoresist with supercritical fluid and developer
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United States of America Patent
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May 16, 2006
Grant Date -
Jan 13, 2005
app pub date -
Aug 3, 2004
filing date -
Feb 15, 2002
priority date (Note) -
Expired
status (Latency Note)
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Abstract
An apparatus for developing a polymeric film without the need for a water rinse step is disclosed. An object having a surface supporting a polymeric film is placed onto a support region within a pressure chamber of the apparatus. A fluid and developer is introduced into the pressure chamber and the object is processed at supercritical conditions to develop the polymeric film such that the polymeric film is not substantially deformed. The pressure chamber is then vented.
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