Method for optimizing the characteristics of integrated circuits components from circuit specifications
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United States of America Patent
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May 16, 2006
Grant Date -
Apr 1, 2004
app pub date -
Oct 16, 2001
filing date -
Oct 17, 2000
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method for selecting a process for forming a device, includes generating a plurality of equations using a response surface methodology model. Each equation relates a respective device simulator input parameter to a respective combination of processing parameters that can be used to form the device or a respective combination of device characteristics. A model of a figure-of-merit circuit is formed that is representative of an integrated circuit into which the device is to be incorporated. One of the combinations of processing parameters or combinations of device characteristics is identified that results in a device satisfying a set of performance specifications for the figure-of-merit circuit, using the plurality of equations and the device simulator.
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