Advanced exposure techniques for programmable lithography

United States of America Patent

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May 23, 2006
Grant Date
Jul 10, 2003
app pub date
Oct 30, 2002
filing date
Oct 30, 2001

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Expired

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Abstract

Advanced techniques for programmable photolithograhy provide enhanced resolution and other aspects of a photolithography system. The pseudo-inverse of a matrix is applied to the results of a calculation to control exposure energies.

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Patent Owner	Address
PIXELLIGENT TECHNOLOGIES LLC	6411 BECKLEY STREET BALTIMORE MD 21224

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G03B:APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS O....

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Inventor Name	Address	# of filed Patents	Total Citations
Case, Andrew	Silver Springs, MD	5	66
Cooper, Gregory D	Alexandria, VA	30	261
Fleet, Erin	Alexandria, VA	5	49

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Advanced exposure techniques for programmable lithography

Number of patents in Portfolio can not be more than 2000

United States of America Patent

10283322

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PATENT NO	7050155
APP PUB NO	20030128347A1
SERIAL NO	10283322
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity Expired	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
May 23, 2006	US,7050155,B2 US7050155B2	GRANTED PATENT AS SECOND PUBLICATION
July 10, 2003	US,20030128347,A1 US20030128347A1	FIRST PUBLISHED PATENT APPLICATION

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10283322

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