Vacuum-assisted pad conditioning system and method utilizing an apertured conditioning disk
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United States of America Patent
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May 30, 2006
Grant Date -
Dec 2, 2004
app pub date -
May 29, 2003
filing date -
May 29, 2003
priority date (Note) -
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status (Latency Note)
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Abstract
A method and apparatus for conditioning polishing pads that utilize an apertured conditioning disk for introducing operation-specific slurries, without the need for additional tooling, platens, and materials handling. The a method and apparatus utilize a vacuum capability to pull waste material out of the conditioning pad and through the apertured conditioning disk to evacuate the apparatus through an outlet port, the apparatus may also include self-contained flushing means and a piezo-electric device for vibrating the pad conditioning apparatus.
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