Direct photo-patterning of nanoporous organosilicates, and method of use
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United States of America Patent
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Jun 6, 2006
Grant Date -
Mar 31, 2005
app pub date -
Sep 30, 2003
filing date -
Sep 30, 2003
priority date (Note) -
Expired
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Abstract
A low dielectric constant, patterned, nanoporous material and a method of forming the material. The material is formed by depositing a layer onto a substrate, said layer comprising a reactive organosilicate material, a porogen, an initiator, and a solvent; exposing portions of the layer to energy (e.g., thermal energy or electromagnetic radiation) to change the solubility of portions of the organosilicate material with respect to the solvent; selectively removing more soluble portions of the layer to generate a relief pattern; and decomposing the porogen to thereby generate a nanoporous organosilicate layer.
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