Lithography apparatus
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United States of America Patent
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Jun 13, 2006
Grant Date -
Mar 18, 2004
app pub date -
Aug 15, 2003
filing date -
Apr 8, 1998
priority date (Note) -
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Abstract
An illumination system for a microlithographic exposure apparatus comprises an adjustable axicon, a variable zoom element, and a multipole illumination mode generating element. By controlling the optical components, the illumination mode can be varied continuously between conventional, annular, and multipole.
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