
US Patent No: 7,064,809
Number of patents in Portfolio can not be more than 2000
Apparatus and method for processing wafers
Stats
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Jun 20, 2006
Issued date -
Jan 31, 2005
filing date -
11/045,481
serial no -
In Force
status
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Abstract
An apparatus for processing semiconductor wafers includes: a wafer support with a first positioning system that can rotate the wafer support coaxially with a wafer; at least one processing apparatus, which can be moved with a second positioning system such that a processing tool proceeding from the processing apparatus can be guided radially over the wafer; and at least one position determining apparatus for determining a wafer position on the basis of features of the wafer. Alignment marks of the wafer are found and points to be processed, such as laser fuses, are moved by rotation of the wafer and movement of at least one processing apparatus in the radial direction above the wafer.
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First Claim
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International Classification(s)
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Cited Art
| Patent Info | (Count) | # Cites | Year |
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| 6,442,312 Optical filter fabrication method and apparatus, optical filter, fiber holder with spiral groove, and phase mask | 5 | 2000 | |
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| 6,009,888 Photoresist and polymer removal by UV laser aqueous oxidant | 19 | 1998 | |
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| 5,479,108 Method and apparatus for handling wafers | 155 | 1992 | |
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| 5,982,166 Method for measuring a characteristic of a semiconductor wafer using cylindrical control | 106 | 1997 | |
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| 5,623,473 Method and apparatus for manufacturing a diffraction grating zone plate | 9 | 1995 | |
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| 6,307,617 Initial alignment system for use in manufacturing an optical filter | 9 | 1999 | |
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| 4,792,658 Device for soldering electronic structural elements of a circuit plate bar | 10 | 1986 | |
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| 6,592,435 Method of and apparatus for manufacturing recording medium | 3 | 2001 | |
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| 6,541,747 Focal mechanism and method for controlling focal point position, and apparatus and method for inspecting semiconductor wafer | 15 | 2000 | |
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| 6,496,245 Developing method and developing apparatus | 13 | 2001 | |
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| 5,029,243 Device for working a workpiece using laser light | 21 | 1989 | |
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| 5,558,110 Apparatus for removing particulate matter | 14 | 1994 | |
Patent Citation Ranking
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Dec 20, 2013 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Dec 20, 2017 |
| Fee | Large entity fee | small entity fee | micro entity fee |
|---|---|---|---|
| Surcharge - 7.5 year - Late payment within 6 months | $160.00 | $80.00 | $40.00 |
| Surcharge - 11.5 year - Late payment within 6 months | $160.00 | $80.00 | $40.00 |
| Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
| Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |