Alignment systems for imprint lithography
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United States of America Patent
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Jul 4, 2006
Grant Date -
Feb 5, 2004
app pub date -
Aug 1, 2002
filing date -
Aug 1, 2002
priority date (Note) -
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Abstract
Described are systems for patterning a substrate by imprint lithography. Imprint lithography systems include an imprint head configured to hold a template in a spaced relation to a substrate. The imprint lithography system is configured to dispense an activating light curable liquid onto a substrate or template. The system includes a light source that applies activating light to cure the activating light curable liquid. Multiple optical imaging devices are used to align the template with the substrate.
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