Lithographic apparatus and device manufacturing method

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 7075616
APP PUB NO 20040211920A1
SERIAL NO

10705785

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Abstract

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In a lithographic projection apparatus, a liquid supply system provides liquid in a space between the final element of the projection system and the substrate of the lithographic projection apparatus. A shutter member is provided to contain liquid in the liquid supply system during, for example, substrate exchange.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B VP O BOX 324 VELDHOVEN 5500 AH

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Derksen, Antonius Theodorus Anna Maria Eindhoven, NL 56 3384
Donders, Sjoerd Nicolaas Lambertus 'S-Hertogenbosch, NL 253 8312
Hoogendam, Christiaan Alexander Veldhoven, NL 205 9950
Lof, Joeri Eindhoven, NL 94 8170
Loopstra, Erik Roelof Heeze, NL 325 13468
Mertens, Jeroen Johannes Sophia Maria Duizel, NL 160 6273
Mulkens, Johannes Catharinus Hubertus Maastricht, NL 213 10886
Sengers, Timotheus Franciscus 'S-Hertogenbosch, NL 61 3237
Straaijer, Alexander Eindhoven, NL 87 8017
Streefkerk, Bob Tilburg, NL 201 10575

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