Step and repeat imprint lithography processes
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United States of America Patent
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Jul 18, 2006
Grant Date -
Jul 1, 2004
app pub date -
Jul 11, 2002
filing date -
Jul 11, 2002
priority date (Note) -
In Force
status (Latency Note)
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Abstract
The present invention is directed to methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. In one embodiment, the imprint process is designed to imprint only a portion of the substrate. The remainder of the substrate is imprinted by moving the template to a different portion of the template and repeating the imprint lithography process.
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