Method for fabricating optical interference display cell
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United States of America Patent
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Jul 18, 2006
Grant Date -
Jan 6, 2005
app pub date -
Mar 11, 2004
filing date -
May 26, 2003
priority date (Note) -
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status (Latency Note)
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Abstract
A method for fabricating an optical interference display cell is described. A first electrode and a sacrificial layer are sequentially formed on a transparent substrate and at least two openings are formed in the first electrode and the sacrificial layer to define a position of the optical interference display cell. An insulated heat-resistant inorganic supporter is formed in each of the openings. A second electrode is formed on the sacrificial layer and the supporters. Finally, a remote plasma etching process is used for removing the sacrificial layer.
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