Method of illuminating a photomask using chevron illumination
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United States of America Patent
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Aug 15, 2006
Grant Date -
Mar 11, 2004
app pub date -
Jul 6, 2001
filing date -
Jul 7, 2000
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A microlithograpic tool, such as a projection stepper, for manufacturing integrated circuits, shapes light that illuminates a photomask with a chevron illumination system. The system uses either a chevron aperture mask of diffractive optical elements to shape a light source into four chevrons (110b, 120b, 130b, 140b). The chevrons are located in the corners of the circular pupil of the condenser lens. The chevrons may be a small a square poles at the corners or as large as an annular square ring. The chevrons provide superior performance for illuminating conventional X and Y oriented features of a photomask.
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