Diffractive optical device, refractive optical device, illumination optical system, exposure apparatus and exposure method

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United States of America Patent

PATENT NO 7095560
SERIAL NO

10860161

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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An illumination optical system having a more simplified structure forms various quadrupole-shaped secondary light sources with two-time rotational symmetry with respect to an optical axis. The apparatus can provide illumination conditions that differ in two perpendicular directions on a radiation-receiving plane. In order to form a secondary light source with a quadrupole-shaped light intensity distribution on an illumination pupil plane, a diffractive optical device is provided in which an entrance light beam is converted into four light beams, and a light beam having a shape of four points centered about the optical axis is formed in a far field. The diffractive optical device is provided with a first diffractive optical member that is rotatable about a first axis parallel to the optical axis, and a second diffractive optical member that is rotatable about a second axis parallel to the optical axis, and that is arranged adjacent to the first diffractive optical member. A refractive optical device having first and second refractive optical members accomplishes similar results.

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Patent Owner(s)

  • NIKON CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Tanitsu, Osamu Kumagaya, JP 95 2381
Toyoda, Mitsunori Tokyo, JP 31 1015

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