Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent
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United States of America Patent
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Aug 29, 2006
Grant Date -
N/A
app pub date -
Oct 11, 2000
filing date -
Oct 11, 2000
priority date (Note) -
Expired
status (Latency Note)
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Abstract
The present invention relates generally to cleaning systems, and more specifically to substrate cleaning systems, such as textile cleaning systems, utilizing an organic cleaning solvent and a pressurized fluid solvent. However, unlike conventional cleaning systems, a conventional drying cycle is not necessary. Particularly, the present invention provides a process for cleaning substrates by cleaning the substrates with an organic solvent in absence of liquid carbon dioxide, and removing the organic solvent from the substrates using a pressurized fluid solvent.
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