Substrate processing device and processing method
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United States of America Patent
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Sep 5, 2006
Grant Date -
Mar 4, 2004
app pub date -
Sep 2, 2003
filing date -
Sep 2, 2002
priority date (Note) -
Expired
status (Latency Note)
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Abstract
In a state where a process gas including SF.sub. 6 and O.sub. 2 is supplied in a chamber, a laser light irradiator provided outside the chamber irradiates a laser light onto a substrate. At the portion of the substrate onto which the laser light is irradiated, the material that makes up the substrate is excited and converted into a gaseous substance by reacting with the process gas. The temperature of the substrate placed on a stage is kept at a predetermined temperature since a temperature adjuster supplies a chiller to a coolant flow passage provided inside the stage.
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