Methods for adaptive real time control of a thermal processing system
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United States of America Patent
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Sep 5, 2006
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app pub date -
Dec 29, 2003
filing date -
Dec 29, 2003
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Abstract
Methods for adaptive real time control of a system for thermal processing substrates, such as semiconductor wafers and display panels. Generally, the method includes creating a dynamic model of the thermal processing system, incorporating wafer bow in the dynamic model, coupling a diffusion-amplification model into the dynamic thermal model, creating a multivariable controller, parameterizing the nominal setpoints, creating a process sensitivity matrix, creating intelligent setpoints using an efficient optimization method and process data, and establishing recipes that select appropriate models and setpoints during run-time.
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