Methods and systems for improved boundary contrast
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United States of America Patent
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Sep 12, 2006
Grant Date -
Mar 18, 2004
app pub date -
Jun 12, 2003
filing date -
Dec 14, 2001
priority date (Note) -
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Abstract
The present invention relates to methods and systems that define feature boundaries in a radiation sensitive medium on a workpiece using a diffraction-type micromirror array, extending to production of patterns and structures on a semiconductor substrate. Workpieces include lithographic masks, integrated circuits and other electronic and optical devices. Particular aspects of the present invention are described in the claims, specification and drawings.
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