Optical system for maskless lithography
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United States of America Patent
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Sep 19, 2006
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app pub date -
Jun 24, 2003
filing date -
Jun 24, 2003
priority date (Note) -
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Abstract
A maskless lithography system including an illuminating system, a SLM having a non-linear shape (e.g., curved, concave, spherical, etc.), an exposure system, and a beam splitter that directs light from the illuminating system to the SLM and from the SLM to the exposure system. In some embodiments, an optical element can be located between the beam splitter and the SLM, possibly to correct for aberrations.
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