Algorithm for real-time process control of electro-polishing
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Sep 26, 2006
Grant Date -
Jul 27, 2006
app pub date -
Jun 6, 2003
filing date -
Sep 16, 2002
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
Method and apparatus for process control of electro-processes. The method includes electro-processing a wafer by the application of two or more biases and determining an amount of charge removed as a result of each bias, separately. In one embodiment, an endpoint is determined for each bias when the amount of charge removed for a bias substantially equals a respective target charge calculated for the bias.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully