Rotating surface of revolution reactor with temperature control mechanisms
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United States of America Patent
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Oct 3, 2006
Grant Date -
N/A
app pub date -
Feb 17, 2000
filing date -
Feb 17, 1999
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A reactor including a rotatable disc (3) having first (5, 19) and second (20, 30) surfaces. Reactant (15) is supplied to the first surface (5, 19) by way of a feed (4), the disc (3) is rotated at high speed, and the reactant (15) forms a film (17) on the surface (5, 19). As the reactant (15) traverses the surface (5, 19) of the disc (3), it undergoes chemical or physical processes before being thrown from the periphery of the disc (3) into collector means (7). Means for supplying a heat transfer fluid (35) to the second surface (20, 30) are also provided so as to allow the first surface (5, 19) and hence the reactant (15) to be cooled or heated.
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