Lithographic projection apparatus using catoptrics in an optical sensor system, optical arrangement, method of measuring, and device manufacturing method
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United States of America Patent
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Oct 3, 2006
Grant Date -
Sep 30, 2004
app pub date -
Dec 22, 2003
filing date -
Mar 8, 1999
priority date (Note) -
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Abstract
A lithographic projection apparatus according to an embodiment of the invention includes a measurement system configured to determine a position of a target portion of a substrate, using at least one among an optical sensing operation and an optical detecting operation. The position is determined via an optical path that includes at least one catoptrical system arranged to have an imaging function of at least one dioptrical element.
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