Method to protect internal components of semiconductor processing equipment using layered superlattice materials
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United States of America Patent
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Oct 10, 2006
Grant Date -
Feb 23, 2006
app pub date -
Aug 23, 2004
filing date -
Aug 23, 2004
priority date (Note) -
Expired
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Abstract
This invention relates to apparatus and a method to protect the internal components of semiconductor processing equipment such as a plasma reactor or a reactive species generator against physical and/or chemical damages during etching and/or cleaning processes. Layered superlattice materials having three or more metal elements such as strontium bismuth tantalate (SBT) are used to form a protective barrier on the surfaces of the internal components of a reaction chamber.
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