Polyamide-based transparent composition

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United States of America Patent

PATENT NO 7122233
APP PUB NO 20050165175A1
SERIAL NO

11041928

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Abstract

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The invention relates to a transparent composition comprising, by weight, the total being 100%: 5 to 40% of an amorphous polyamide (B) which results essentially from the condensation: either of at least one diamine chosen from cycloaliphatic diamines and aliphatic diamines and of at least one diacid chosen from cycloaliphatic diacids and aliphatic diacids, at least one of these diamine or diacid units being cycloaliphatic, or of a cycloaliphatic .alpha.,.omega.-aminocarboxylic acid, or of a combination of these two possibilities, and optionally of at least one monomer chosen from .alpha.,.omega.-aminocarboxylic acids or the possible corresponding lactams, aliphatic diacids and aliphatic diamines, 0 to 40% of a supple polyamide (C) chosen from copolymers containing polyamide blocks and polyether blocks and copolyamides, 0 to 20% of a compatabilizer (D) for (A) and (B), 0 to 40% of a supple modifier (M), with the condition that (C)+(D)+(M) is between 0 and 50%, the remainder to 100% being a semi-crystalline polyamide (A). The invention also relates to the articles obtained, such as plates, films, sheets, tubes and profiles, the articles obtained by injection moulding and in particular the films and sheets which are then bonded to skis.The invention also relates to the above articles decorated, for example, by sublimation, and coated with a transparent protective layer consisting of the composition of the invention.

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Patent Owner(s)

  • ATOFINA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Montanari, Thibaut Bernay, FR 53 302
Recoquille, Christelle Nassandres, FR 12 48

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