Workpiece holder for vacuum processing
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United States of America Patent
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Oct 24, 2006
Grant Date -
N/A
app pub date -
Mar 23, 2005
filing date -
Mar 23, 2005
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A substrate for use in a vacuum chamber has a workpiece supporting surface that has two or more mutually electrically insulated bifilar conductors configured as interleaved spirals disposed on it. Each of these bifilar conductors has a respective electrode at each of its two ends. This provides an electrostatic chuck for clamping a workpiece to the supporting surface when an electric voltage is applied between the two bifilar conductors or between one of the two bifilar conductors and an insulating workpiece. This arrangement also provides for electric heating of the workpiece when an electric voltage is applied between the two electrodes associated with one of the bifilar conductors. Moreover, when the electrical resistance of at least one of the bifilar conductors is known as a function of temperature, this arrangement allows one to sense the temperature of a workpiece supported on the substrate.
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