Devices having improved capacitance and methods of their fabrication
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United States of America Patent
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Oct 24, 2006
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N/A
app pub date -
Sep 22, 2004
filing date -
Jul 8, 1996
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Abstract
A capacitor formed by a process using only two deposition steps and a dielectric formed by oxidizing a metal layer in an electrolytic solution. The capacitor has first and second conductive plates and a dielectric is formed from the first conductive plate.
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