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Abstract

In a multi-exposure drawing method for drawing a pattern on a drawing surface, using an exposure unit including a plurality of optical modulation elements arranged in both a first array-direction and a second array-direction, the exposure unit is moved in relation to the drawing surface in a drawing direction. The drawing direction is inclined to form an angle with respect to the first array-direction, whereby the exposure unit is gradually shifted in the second array-direction during the movement of the exposure unit. The modulation elements are successively and selectively operated based on pattern bit-data to thereby modulate a light beam made incident on each modulation element, whenever the exposure unit is moved in the drawing direction by a distance of 'A+a'. 'A' is a distance corresponding to an integer-multiple of a dimension of a unit exposure zone produced on the drawing surface by each modulation element, and 'a' is a smaller distance than the dimension of the unit exposure.

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First Claim