Method for aberration detection and measurement

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United States of America Patent

PATENT NO 7136143
SERIAL NO

10734462

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Abstract

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Aberrations in an optical system can be detected and measured using a method comprised of a test target in the object plane of a projection system and imaging a photoresist film with the system. The test target comprises at least one open figure which comprises a multiple component array of phase zones, where the multiple zones are arranged within the open figure so that their response to lens aberration is interrelated and the zones respond uniquely to specific aberrations depending on their location within the figure. The method detects aberration types including coma, spherical, astigmatism, and three-point through the exposure of a photoresist material placed in the image plane of the system and the evaluation of these images.

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Patent Owner(s)

Patent OwnerAddress
SMITH BRUCE WNot Provided

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Smith, Bruce W Penfield, NY 29 877

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