Method and apparatus for an improved deposition shield in a plasma processing system
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United States of America Patent
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Nov 21, 2006
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app pub date -
Sep 30, 2002
filing date -
Sep 30, 2002
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Abstract
The present invention presents an improved deposition shield for surrounding a process space in a plasma processing system, wherein the design and fabrication of the deposition shield advantageously provides for a clean processing plasma in the process space with substantially minimal erosion of the deposition shield.
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