Enhanced process and profile simulator algorithms
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Nov 21, 2006
Issued Date -
N/A
app pub date -
Sep 1, 2004
filing date -
Mar 3, 1998
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A method for enhancing a process and profile simulator algorithm predicts the surface profile that a given plasma process will create. An energetic particle is first tracked. The ion fluxes produced by the energetic particle are then recorded. A local etch rate and a local deposition rate are computed from neutral fluxes, surface chemical coverage, and surface material type that are solved simultaneously.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully