Detection and handling of semiconductor wafers and wafers-like objects
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United States of America Patent
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Dec 5, 2006
Issued Date -
N/A
app pub date -
Mar 25, 2003
filing date -
Aug 4, 2000
priority date (Note) -
Expired
status (Latency Note)
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Abstract
An end-effector includes multiple vortex chucks for supporting a wafer. Vortex chucks are located along the periphery of the end-effector to help prevent a flexible wafer from curling. The end-effector has limiters to restrict the lateral movement of a supported wafer. In one example, the end-effector has a detector for detecting the presence of a wafer. The detector is mounted at a shallow angle to allow the end-effector to be positioned close to a wafer to be picked-up, thereby allowing detection of deformed wafers contained in a wafer cassette. The shallow angle of the detector also minimizes the thickness of the end-effector. Also disclosed is a wafer station with features similar to that of the end-effector.
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