Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system
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United States of America Patent
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Dec 12, 2006
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app pub date -
Sep 30, 2002
filing date -
Sep 30, 2002
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Abstract
The present invention presents an improved upper electrode for a plasma processing system, wherein the design and fabrication of an electrode plate with a deposition shield coupled to the upper electrode advantageously provides gas injection of a process gas with substantially minimal erosion of the upper electrode while providing protection to a chamber interior.
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