Method for rapid prototyping by using linear light as sources

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United States of America Patent

PATENT NO 7158849
APP PUB NO 20060100734A1
SERIAL NO

10974744

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Abstract

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A method for rapid prototyping by using linear light as sources employs DLP (Radiation Hardening Formation) or LCD, together with the portable devices and linear light source to treat the raw material in two stages. The first stage is to spread the raw material to a selected zone by nozzles or rollers and illuminating the material to let the material being processed and have physical o mechanical changes. The second stage is to use more powerful linear light source with the cooperation of the portable DMD (Digital Micromirror Device) or LCD (Liquid Crystal Display) to illuminate the material to make it have a second times of physical o mechanical changes. By the piling up the layers of the material, a complete 3-D work piece is obtained.

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Patent Owner(s)

Patent OwnerAddress
NATIONAL CHENG KUNG UNIVERSITYTAINAN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Chieh-Li Tainan, TW 12 116
Chen, Chuh-Yung Tainan, TW 18 99
Cheng, Chun-I Jiading Township, Kaohsiung County, TW 11 135
Hsieh, Chen Tainan, TW 14 117
Huang, Sheng-Jye Tainan, TW 3 47
Lai, Wei-Siang Tainan, TW 2 47
Lee, Sen-Yung Tainan, TW 30 251
Leu, Tzong-Shing Tainan, TW 2 47
Wang, Cheng-Chien Rende Township, Tainan Couny, TW 13 100
Wang, Chuih-Kuan Tainan, TW 5 61
Wang, Chun-Shan Tainan, TW 24 213

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