Dual stage lithographic apparatus and device manufacturing method
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United States of America Patent
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Jan 9, 2007
Issued Date -
N/A
app pub date -
May 24, 2005
filing date -
Apr 8, 2005
priority date (Note) -
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Abstract
The invention relates to a dual stage lithographic apparatus, wherein two substrate stages are constructed and arranged for mutual cooperation in order to perform a joint scan movement. The joint scan movement brings the lithographic apparatus from a first configuration, wherein immersion liquid is confined between a first substrate held by the first stage of the stages and a projection system of the apparatus, to a second configuration, wherein the immersion liquid is confined between a second substrate held by the second stage of the two stages and the projection system, such that during the joint scan movement the liquid is essentially confined within the space with respect to the projection system.
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