Progressive self-learning defect review and classification method
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United States of America Patent
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Jan 9, 2007
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app pub date -
Dec 20, 2002
filing date -
Dec 20, 2002
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Abstract
A progressive self-learning (PSL) method is provided for enhancing wafer or mask defect inspection review and classification by identifying a plurality of wafer or mask defects, and by classifying each of the plurality of defects according to an extent of resemblance of each defect. The method having the steps of: performing image processing on a scanned defect image; aligning the scanned defect image with a just-stored digitized defect image; matching the scanned defect image with a just-stored digitized defect image; and classifying the scanned defect image.
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