Method and apparatus for an improved optical window deposition shield in a plasma processing system
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United States of America Patent
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Jan 16, 2007
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app pub date -
Mar 19, 2004
filing date -
Sep 30, 2002
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Abstract
The present invention presents an improved optical window deposition shield for optical access to a process space in a plasma processing system through a deposition shield, wherein the design and fabrication of the optical window deposition shield advantageously provides an optically clean access to the processing plasma in the process space while sustaining substantially minimal erosion of the optical window deposition shield.
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