Method and apparatus for an improved baffle plate in a plasma processing system
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United States of America Patent
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Jan 23, 2007
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app pub date -
Sep 30, 2002
filing date -
Sep 30, 2002
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Abstract
The present invention presents an improved baffle plate for a plasma processing system, wherein the design and fabrication of the baffle plate advantageously provides for a uniform processing plasma in the process space with substantially minimal erosion of the baffle plate.
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