Lithographic apparatus, device manufacturing method, and device manufactured thereby

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Feb 6, 2007
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Nov 15, 2005
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Nov 27, 2002

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Abstract

Apparatus and methods for compensating for the movement of a substrate in a lithographic apparatus during a pulse of radiation include providing an optical structure configured to move a patterned projection beam incident on the substrate in synchronism with the substrate.

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Patent Owner	Address
ASML NETHERLANDS B V	VELDHOVEN

International Classification(s)

G03B:APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS O....

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Inventor Name	Address	# of filed Patents	Total Citations
Benschop, Jozef Petrus Henricus	Veldhoven, NL	29	592
Bleeker, Arno Jan	Westerhoven, NL	99	3022

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Lithographic apparatus, device manufacturing method, and device manufactured thereby

Number of patents in Portfolio can not be more than 2000

United States of America Patent

11273436

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US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
February 06, 2007	US,7173687,B2 US7173687B2	GRANTED PATENT AS SECOND PUBLICATION
March 23, 2006	US,20060061749,A1 US20060061749A1	FIRST PUBLISHED PATENT APPLICATION

PATENT NO	7173687
SERIAL NO	11273436
DOCKET NO

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11273436

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