
US Patent No: 7,176,114
Number of patents in Portfolio can not be more than 2000
Method of depositing patterned films of materials using a positive imaging process
Stats
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Feb 13, 2007
Issued date -
Jul 30, 2003
filing date -
10/630,301
serial no -
Expired
status
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Abstract
The invention generally encompasses a method for forming a pattern on a substrate. The method comprises applying a precursor comprising at least one metal to a substrate to form a precursor layer, exposing a predetermined portion of the precursor layer and developing the predetermined portion of the precursor layer. The developing step removes, or at least substantially removes, the predetermined portion from the substrate, thereby forming a pattern on the substrate that comprises a remaining portion of the precursor. In one embodiment, the precursor layer comprises Ti(Pr.sup.iO).sub.2(EAA).sub.2.
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First Claim
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International Classification(s)
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Cited Art
| Patent Info | (Count) | # Cites | Year |
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| 5,534,312 Method for directly depositing metal containing patterned films | 44 | 1994 | |
| 6,348,239 Method for depositing metal and metal oxide films and patterned films | 8 | 2000 | |
| 6,458,431 Methods for the lithographic deposition of materials containing nanoparticles | 23 | 2001 | |
| 6,723,388 Method of depositing nanostructured films with embedded nanopores | 10 | 2002 | |
| 6,787,198 Hydrothermal treatment of nanostructured films | 4 | 2002 | |
| 2005/0285,312 Use of PMOD materials in layered (3D) manufacturing technology | 2 | 2004 | |
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| 5,272,099 Fabrication of transistor contacts | 29 | 1992 | |
| 5,935,762 Two-layered TSI process for dual damascene patterning | 67 | 1997 | |
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| 6,790,579 Photoresist compositions comprising polycyclic polymers with acid labile pendant groups | 11 | 2000 | |
| 6,723,486 Photoresist compositions comprising polycyclic polymers with acid labile pendant groups | 14 | 2001 | |
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| 6,072,207 Process for fabricating layered superlattice materials and making electronic devices including same | 15 | 1995 | |
| 5,849,465 Photosensitive titanium carboxydiketonate and titanium carboxyketoester precursor solutions and method of patterning integrated circuits using the same | 8 | 1996 | |
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| 5,652,166 Process for fabricating dual-gate CMOS having in-situ nitrogen-doped polysilicon by rapid thermal chemical vapor deposition | 22 | 1996 | |
| 5,627,087 Process for fabricating metal-oxide semiconductor (MOS) transistors based on lightly doped drain (LDD) structure | 10 | 1996 | |
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| 2004/0087,690 Ionic photoacid generators with segmented hydrocarbon-fluorocarbon sulfonate anions | 23 | 2002 | |
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| 2003/0073,042 Process and materials for formation of patterned films of functional materials | 27 | 2001 | |
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| 4,770,590 Method and apparatus for transferring wafers between cassettes and a boat | 182 | 1986 | |
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| 5,292,558 Process for metal deposition for microelectronic interconnections | 65 | 1991 | |
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| 5,140,366 Exposure apparatus with a function for controlling alignment by use of latent images | 36 | 1991 | |
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| 6,387,012 Metal complex solution, photosensitive metal complex solution, and method for forming metallic oxide films | 6 | 1999 | |
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| 5,716,758 Process for forming fine pattern for semiconductor device utilizing multiple interlaced exposure masks | 14 | 1997 | |
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| 5,178,989 Pattern forming and transferring processes | 33 | 1989 | |
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| 5,470,693 Method of forming patterned polyimide films | 72 | 1992 | |
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| 5,989,759 Pattern forming method using alignment from latent image or base pattern on substrate | 25 | 1998 | |
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| 6,307,087 Ligands for metals and improved metal-catalyzed processes based thereon | 45 | 1999 | |
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| 5,436,176 Method for fabricating a semiconductor device by high energy ion implantation while minimizing damage within the semiconductor substrate | 24 | 1992 | |
Patent Citation Ranking
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Aug 13, 2014 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Aug 13, 2018 |
| Fee | Large entity fee | small entity fee | micro entity fee |
|---|---|---|---|
| Surcharge - 7.5 year - Late payment within 6 months | $160.00 | $80.00 | $40.00 |
| Surcharge - 11.5 year - Late payment within 6 months | $160.00 | $80.00 | $40.00 |
| Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
| Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |