Apparatus for wafer inspection
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United States of America Patent
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Feb 20, 2007
Grant Date -
Dec 2, 2004
app pub date -
May 17, 2004
filing date -
May 30, 2003
priority date (Note) -
In Force
status (Latency Note)
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Abstract
An apparatus for wafer inspection is described, comprising an incident-light illumination device (5) having an illumination axis and an imaging device (9) having an image axis, both of which are inclined with respect to one another and are directed onto a region to be inspected of the surface (42) of a wafer (2). According to the present invention, the apparatus is characterized in that the incident-light illumination device (5) and the imaging device (9, 19) each have associated with them a polarizing means whose transmission axes are oriented at a predetermined angle to one another.
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