Methods for etch loading planar lightwave circuits
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United States of America Patent
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Feb 27, 2007
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app pub date -
Feb 6, 2004
filing date -
May 11, 2001
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Abstract
This relates to optical devices such as planar light-wave components/circuits which are designed to have a high waveguide pattern density effecting a higher etch selectivity and overall improved dimensional control of the functional waveguides on the optical device.
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